Method for fabricating glass substrate package

ABSTRACT

A display device comprises a display panel substrate and a glass substrate over said display panel substrate, wherein said display panel substrate comprises multiple contact pads, a display area, a first boundary, a second boundary, a third boundary and a fourth boundary, wherein said display area comprises a first edge, a second edge, a third edge and a fourth edge, wherein said first boundary is parallel to said third boundary and said first and third edges, wherein said second boundary is parallel to said fourth boundary and said second and fourth edges, wherein a first least distance between said first boundary and said first edge, wherein a second least distance between said second boundary and said second edge, a third least distance between said third boundary and said third edge, a fourth distance between said fourth boundary and said fourth edge, and wherein said first, second, third and fourth least distances are smaller than 100 micrometers, and wherein said glass substrate comprising multiple metal conductors through in said glass substrate and multiple metal bumps are between said glass substrate and said display panel substrate, wherein said one of said metal conductors is connected to one of said contact pads through one of said metal bumps.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of priority from U.S. ProvisionalPatent Application Ser. No. 62/219,249, filed Sep. 16, 2015, all ofwhich is incorporated herein by reference in their entirety. Thisapplication is a continuation-in-part of application Ser. No.14/036,256, filed Sep. 25, 2013, which claims the benefit of priorityfrom U.S. Provisional Patent Application Ser. No. 61/705,649, filed Sep.25, 2013, all of which is incorporated herein by reference in theirentirety.

BACKGROUND OF THE DISCLOSURE

Field of the Disclosure

The patent disclosure a method and structure to manufacture a glasssubstrate, and disclosed embodiments relate to one or more chip buildinga system on the glass substrate.

Brief Description of the Related Art

As is well known, microelectronic devices have a tendency to beminimized and thinned with its functional development and asemiconductor package mounted on a mother board is also following thetendency in order to realize a mounting of high integration.

When the geometric dimensions of the Integrated Circuits are scaleddown, the cost per die is decreased while some aspects of performanceare improved. The metal connections which connect the Integrated Circuitto other circuit or system components become of relative more importanceand have, with the further miniaturization of the IC, an increasinglynegative impact on the circuit performance. The parasitic capacitanceand resistance of the metal interconnections increase, which degradesthe chip performance significantly. Of most concern in this respect isthe voltage drop along the power and ground buses and the RC delay ofthe critical signal paths. Attempts to reduce the resistance by usingwider metal lines result in higher capacitance of these wires.

To solve this problem, the approach has been taken to develop lowresistance metal (such as copper) for the wires while low dielectricmaterials are used in between signal lines.

Increased Input-Output (IO) combined with increased demands for highperformance IC's has led to the development of Flip Chip Packages.Flip-chip technology fabricates bumps (typically Pb/Sn solders) on Alpads on chip and interconnect the bumps directly to the package media,which are usually ceramic or plastic based. The flip-chip is bonded facedown to the package medium through the shortest path. These technologiescan be applied not only to single-chip packaging, but also to higher orintegrated levels of packaging in which the packages are larger and tomore sophisticated substrates that accommodate several chips to formlarger functional units.

The flip-chip technique, using an area array, has the advantage ofachieving the highest density of interconnection to the device and avery low inductance interconnection to the package. However,pre-testability, post-bonding visual inspection, and TCE (TemperatureCoefficient of Expansion) matching to avoid solder bump fatigue arestill challenges.

Glass can be used as an interposer to bridge between one or more ICchips and a printed circuit board. In many respects, when used as aninterposer/substrate and without the requirement for active devices,glass can be a good substitute for a silicon interposer. The advantagesof glass in comparison to silicon as an interposer lie in its much lowermaterial cost. Glass also has a CTE closely matched to silicon, so thatreliability of interconnects, especially micro-bonds, can be expected tobe quite good. Glass has some disadvantages in comparison tosilicon—notably its lower thermal conductivity and the difficulty informing Through Glass Vias (TGV's). Both of these topics are discussedelsewhere in this patent.

SUMMARY OF THE DISCLOSURE

Embodiments of the present disclosure provide A display device comprisesa display panel substrate and a glass substrate over said display panelsubstrate, wherein said display panel substrate comprises multiplecontact pads, a display area, a first boundary, a second boundary, athird boundary and a fourth boundary, wherein said display areacomprises a first edge, a second edge, a third edge and a fourth edge,wherein said first boundary is parallel to said third boundary and saidfirst and third edges, wherein said second boundary is parallel to saidfourth boundary and said second and fourth edges, wherein a first leastdistance between said first boundary and said first edge, wherein asecond least distance between said second boundary and said second edge,a third least distance between said third boundary and said third edge,a fourth distance between said fourth boundary and said fourth edge, andwherein said first, second, third and fourth least distances are smallerthan 100 micrometers, and wherein said glass substrate comprisingmultiple metal conductors through in said glass substrate and multiplemetal bumps are between said glass substrate and said display panelsubstrate, wherein said one of said metal conductors is connected to oneof said contact pads through one of said metal bumps.

These, as well as other components, steps, features, benefits, andadvantages of the present disclosure, will now become clear from areview of the following detailed description of illustrativeembodiments, the accompanying drawings, and the claims.

BRIEF DESCRIPTION OF THE DRAWINGS

The drawings disclose illustrative embodiments. They do not set forthall embodiments. Other embodiments may be used in addition or instead.Details that may be apparent or unnecessary may be omitted to save spaceor for more effective illustration. Conversely, some embodiments may bepracticed without all of the details that are disclosed. When the samenumeral appears in different drawings, it refers to the same or likecomponents or steps.

Aspects of the disclosure may be more fully understood from thefollowing description when read together with the accompanying drawings,which are to be regarded as illustrative in nature, and not as limiting.The drawings are not necessarily to scale, emphasis instead being placedon the principles of the disclosure.

FIG. 1 illustrates a three-dimensional view of a X-axis nets and aY-axis nets, in accordance with the present disclosure.

FIG. 2 illustrates a cross-section view of the X-axis nets and theY-axis nets, in accordance with the present disclosure.

FIG. 3 illustrates a cross-section view of the Z-axis traces crossed tothe X-axis nets and the Y-axis nets, in accordance with the presentdisclosure.

FIG. 4 illustrates a three-dimensional view of the Z-axis traces, X-axisnets and the Y-axis nets, in accordance with the present disclosure.

FIG. 5a-5i illustrate the shape and structure of the Z-axis traces, inaccordance with the present disclosure.

FIGS. 6a-6j are illustrate a 1^(st) process of forming a glasssubstrate, in accordance with the present disclosure.

FIGS. 6k-6n illustrate a top views of the 1^(st) process of forming theglass substrate, in accordance with the present disclosure.

FIGS. 7a-7o are illustrate a 2^(nd) process of forming the glasssubstrate, in accordance with the present disclosure.

FIGS. 7p-7r illustrate a top views of the 2^(nd) process of forming theglass substrate, in accordance with the present disclosure.

FIGS. 8a-8d illustrate cross-section views of the glass substrate andthe metal plug, in accordance with the present disclosure.

FIGS. 9a-9s illustrate a process to form multiple traces on a topsurface and a bottom surface of the glass substrate, in accordance withthe present disclosure.

FIGS. 9t-9u illustrate cross-section views of multiple chips formed onthe glass substrate, in accordance with the present disclosure.

FIG. 9v illustrates a cross-section view of the metal bump, inaccordance with the present disclosure.

FIG. 9w illustrates a cross-section view of multiple chips formed on atop surface and bottom surface of the glass substrate, in accordancewith the present disclosure.

FIG. 9x illustrates a cross-section view of multiple chips and a 3D-ICpackage formed on a top surface and bottom surface of the glasssubstrate, in accordance with the present disclosure.

FIG. 9y illustrates a top views of the multiple chips on the glasssubstrate, in accordance with the present disclosure.

FIGS. 10a-10j illustrates a damascene process to form the metal layer onthe glass substrate, in accordance with the present disclosure.

FIGS. 11a-11i illustrates an embossing process to form the metal layeron the glass substrate, in accordance with the present disclosure.

FIG. 12 illustrates a cross-section view of the glass substrate of thefirst application formed on an OLED display substrate, in accordancewith the present disclosure.

FIG. 13 illustrates a cross-section view of the glass substrate of thesecond application formed on a MEMs display substrate, in accordancewith the present disclosure.

FIG. 14 illustrates a cross-section view of the glass substrate of thethird application formed on a LCD display substrate, in accordance withthe present disclosure.

FIG. 15 illustrates a cross-section view of the glass substrate of thefourth application formed on an another LCD display substrate, inaccordance with the present disclosure.

FIG. 16 illustrates a cross-section view of the glass substrate of thefifth application formed on an OLED display substrate, in accordancewith the present disclosure.

FIG. 17a illustrates a cross-section view of the glass substrate of thesixth application formed on an OLED display substrate, in accordancewith the present disclosure.

FIG. 17b illustrates a cross-section view of the structure of the OLEDdisplay substrate, in accordance with the present disclosure.

FIG. 18 illustrates a three-dimensional view of the display device, inaccordance with the present disclosure.

FIG. 19 illustrates a big display device combined from multiple displaydevice, in accordance with the present disclosure.

While certain embodiments are depicted in the drawings, one skilled inthe art will appreciate that the embodiments depicted are illustrativeand that variations of those shown, as well as other embodimentsdescribed herein, may be envisioned and practiced within the scope ofthe present disclosure.

DETAILED DESCRIPTION OF THE DISCLOSURE

FIG. 1 illustrates a three-dimensional view of a net 2, 4, wherein thenet 4 is under the net 2, wherein the net 2 comprises multiple Y-axistraces 2 a and multiple X-axis traces 2 b under the Y-axis traces 2 a,and wherein the net 4 comprises multiple Y-axis traces 4 a and multipleX-axis traces 4 b under the Y-axis traces 4 a. Multiple gaps 3, 5 formin the net 2 and 4. Each of the traces 2 a, 2 b, 4 a and 4 b is easilymove to change the size of gaps 3 and gaps 5. The diameter (or width) oftraces 2 a, 2 b, 4 a and 4 b are the same, such as between 10 and 30micrometers, between 20 and 100 micrometers, between 40 and 150micrometers, between 50 and 200 micrometers, between 200 and 1000micrometers or between 500 and 10000 micrometers. The traces 2 a, 2 b, 4a and 4 b may be metal traces or polymer traces, such as copper traces,copper-gold alloy traces, copper-gold-palladium alloy traces,copper-gold-silver alloy traces, copper-platinum alloy traces,copper-iron alloy traces, copper-nickel alloy traces, copper-tungstentraces, tungsten traces, brass wires, zinc plated brass wires, stainlesswires, nickel plated stainless wires, phosphor bronze wires, copperplated the aluminum wires, aluminum traces, phenolic resin traces, epoxyresin traces, melamine-formaldehyde resin traces or polysiloxanes resintraces. The cross-section shape of traces 2 a, 2 b, 4 a and 4 b may be acircular shape, a Square shape, an oblong shape, a rectangle shape or aflat shape.

FIG. 2 illustrates a cross-section view of the net 2 and the net 4. Thegaps 3 and gaps 5 are aligned with each other.

Next, referring to FIG. 3, multiple metal traces 6 are crossed the net 2and the net 4 through the gaps 3 and gaps 5. The diameter (or width) ofmetal traces 6 is between 10 and 30 micrometers, between 20 and 100micrometers, between 40 and 150 micrometers, between 50 and 200micrometers, between 200 and 1000 micrometers or between 500 and 10000micrometers. The traces 6 may be metal traces, such as copper traces,copper-gold alloy traces, copper-gold-palladium alloy traces,copper-gold-silver alloy traces, copper-platinum alloy traces,copper-iron alloy traces, copper-nickel alloy traces, copper-tungstentraces, tungsten traces, brass wires, zinc plated brass wires, stainlesswires, nickel plated stainless wires, phosphor bronze wires, copperplated the aluminum wires, aluminum traces, titanium-containing layerplated the copper wires, tantalum-containing layer plated the copperwires. The cross-section shape of traces 6 may be a circular shape, asquare shape, an oblong shape, a rectangle shape or a flat shape. Thediameter (or width) of traces 6 may be the same with the traces 2 a, 2b, 4 a and 4 b or different with the traces 2 a, 2 b, 4 a and 4 b.

Furthermore, we proposed the material of the traces 6 is copper-tungstenalloy, wherein the copper in the copper-tungsten alloy is 50 percent andthe tungsten in the copper-tungsten alloy is 50 percent, the copper inthe copper-tungsten alloy is 60 percent and the tungsten in thecopper-tungsten alloy is 40 percent, the copper in the copper-tungstenalloy is 70 percent and the tungsten in the copper-tungsten alloy is 30percent, the copper in the copper-tungsten alloy is 80 percent and thetungsten in the copper-tungsten alloy is 20 percent, the copper in thecopper-tungsten alloy is 90 percent and the tungsten in thecopper-tungsten alloy is 10 percent, the copper in the copper-tungstenalloy is 40 percent and the tungsten in the copper-tungsten alloy is 60percent, the copper in the copper-tungsten alloy is 30 percent and thetungsten in the copper-tungsten alloy is 70 percent.

FIG. 4 illustrates a three-dimensional view of a net 2, 4 and traces 6.

FIG. 5a-5i illustrates the shape and structure of the traces 6. In FIG.5a , the cross-section shape of traces 6 is a circular shape. In FIG. 5d, the cross-section shape of traces 6 is a square shape. In FIG. 5g ,the cross-section shape of traces 6 is a rectangle shape. In FIG. 5b ,the cross-section shape of traces 6 is a circular shape and a firstcovering layer 6 a is cover on the traces 6, wherein the first coveringlayer 6 a may be a metal layer, such as a nickel-containing layer, azinc-containing layer, a titanium-containing layer, atantalum-containing layer, a silver-containing layer, achromium-containing layer and wherein the first covering layer 6 a maybe an anti-oxidation layer, such as an oxide-containing layer. In FIG.5e , the cross-section shape of traces 6 is a square shape and a firstcovering layer 6 a is cover on the traces 6, wherein the first coveringlayer 6 a may be a metal layer, such as a nickel-containing layer, azinc-containing layer, a titanium-containing layer, atantalum-containing layer, a silver-containing layer, achromium-containing layer and wherein the first covering layer 6 a maybe an anti-oxidation layer, such as an oxide-containing layer. In FIG.5h , the cross-section shape of traces 6 is a rectangle shape and afirst covering layer 6 a is cover on the traces 6, wherein the firstcovering layer 6 a may be a metal layer, such as a nickel-containinglayer, a zinc-containing layer, a titanium-containing layer, atantalum-containing layer, a silver-containing layer, achromium-containing layer and wherein the first covering layer 6 a maybe an anti-oxidation layer, such as an oxide-containing layer. In FIG.5c , the cross-section shape of traces 6 is a circular shape and asecond covering layer 6 b is cover on the first covering layer 6 a,wherein the second covering layer 6 b may be an adhesion layer, such asa nickel-containing layer, a zinc-containing layer, atitanium-containing layer, a tantalum-containing layer, asilver-containing layer, a chromium-containing layer and wherein thefirst covering layer 6 a may be an anti-oxidation layer, such as anoxide-containing layer. In FIG. 5f , the cross-section shape of traces 6is a square shape and a second covering layer 6 b is cover on the firstcovering layer 6 a, wherein the second covering layer 6 b may be anadhesion layer, such as a nickel-containing layer, a zinc-containinglayer, a titanium-containing layer, a tantalum-containing layer, asilver-containing layer, a chromium-containing layer and wherein thefirst covering layer 6 a may be an anti-oxidation layer, such as anoxide-containing layer. In FIG. 5i , the cross-section shape of traces 6is an oblong shape and a second covering layer 6 b is cover on the firstcovering layer 6 a, wherein the second covering layer 6 b may be anadhesion layer, such as a nickel-containing layer, a zinc-containinglayer, a titanium-containing layer, a tantalum-containing layer, asilver-containing layer, a chromium-containing layer and wherein thefirst covering layer 6 a may be an anti-oxidation layer, such as anoxide-containing layer.

Next, FIGS. 6a-6j are illustrated a 1^(st) process of forming a glasssubstrate of the invention. Please referring to FIG. 6a , the traces 6are stretched to a suitable length L1, e.g., smaller than 5 meters, suchas between 0.5 and 1 meter, or between 1 and 3 meters. In the same time,the net 4 is moved down to a suitable location. The pitch t1 between thetraces 2 a, 2 b, 4 a, 4 b is greater than the diameter (or width) oftraces 6.

Next, referring to FIG. 6b , the traces 2 a, 2 b, 4 a and 4 b are movedto change the pitch t1 to a pitch t2, then the traces 6 are closed up toa pitch t3. The pitch t3 substantially the same with the diameter (orwidth) of the traces 2 a, 2 b, 4 a and 4 b, such as between 5 and 20micrometers, between 20 and 50 micrometers, between 30 and 80micrometers, between 20 and 100 micrometers, between 40 and 150micrometers, between 50 and 200 micrometers, between 200 and 1000micrometers or between 500 and 10000 micrometers. In the same time, maybe apply a force to stretch the traces 6, 2 a, 2 b, 4 a and 4 b and makethe traces 6 keep strength and keep the pitch t3 fixed.

Next, referring to FIG. 6c , a thermal resistance layer 8 is formed onsurfaces of the net 4. The thermal resistance layer 8 may be a polymerlayer, such as a thermosetting resin, phenolic resin, epoxy resin,melamine-formaldehyde resin, polysiloxanes resin, plaster layer, whereinthe thermal resistance layer 8 has a heat deflection temperature between400 and 900° C. When a liquid thermal resistance layer 8 formed on thenet 4 and the thermal resistance layer 8 permeated the net 4 through thegaps 5, wherein the thermal resistance layer 8 cover the gaps 5 betweentraces 4 a, traces 4 b and traces 6, then curing the thermal resistancelayer 8. The thermal resistance layer 8 has a thickness between 0.05 and1 meter.

Next, referring to FIG. 6d , a mold 10 is provided between the net 2 andthe net 4, wherein the mold 10 surrounds the traces 6 and on the thermalresistance layer 8. The mold 10 is hold up by a machine or a device. Themold 10 may be a metal mold, a ceramics mold or a polymer mold, whichhas a heat deflection temperature between 400° C. and 900° C. or between800° C. and 1300° C.

Next, referring to FIG. 6e , a fixed layer 12 is formed on the thermalresistance layer 8, wherein the fixed layer 12 may be a glass layer or apolymer layer. When the material of the fixed layer 12 is glass, thefixed layer 12 is a high temperature liquid to form on the thermalresistance layer 8, and then the fixed layer 12 down to a suitabletemperature becomes a solid state. The fixed layer 12 has a thicknessbetween 0.01 and 1 meter. The bottom of traces 6 are fixed by the fixedlayer 12.

Next, referring to FIG. 6f , the traces 6 under the net 4 are cut. Atank 14 carries the mold 10, net 4 and the fixed layer 12.

Next, referring to FIG. 6g , a glass layer (liquid form) 16 is formed onthe fixed layer 12. The glass layer 16 is a high temperature liquid toform on the fixed layer 12 and fill in the mold 10, and then the glasslayer 16 down to a suitable temperature becomes a solid state, whereinthe glass layer 16 has a glass transition temperature between 300° C.and 900° C., between 500° C. and 800° C., between 900° C. and 1200° C.or between 1000° C. and 1800° C. The glass layer 16 is a low meltingpoint glass material, wherein the glass layer 16 has a melting pointbetween 300° C. and 900° C., 800° C. and 1300° C., between 900° C. and1600° C., between 1000° C. and 1850° C., or between 1000° C. and 2000°C., wherein the melting point may smaller than 1500° C. The glass layer16 has a thickness greater than 0.5 meters or greater than 0.1 meter.Furthermore, there is a few bubbles or no bubble in glass layer 16, forexample, there is zero to 3 bubbles in one cubic meter of the glasslayer 16, 1 to 10 bubbles in one cubic meter of the glass layer 16, 5 to30 bubbles in one cubic meter of the glass layer 16 or 20 to 60 bubblesin one cubic meter of the glass layer 16, wherein the bubble has adiameter between 0.0001 and 0.001 centimeters, between 0.001 and 0.05centimeters, between 0.05 and 0.1 centimeters or between 0.05 and 0.5centimeters. The glass layer 16 may be remove bubbles through multiplelaminating process, squeezing process and heating process.

The glass layer 16 refers to an amorphous solid. The material of theglass layer 16 may be included soda-lime glass, boro-silicate glass,alumo-silicate glass, fluoride glasses, phosphate glasses or chalcogenglasses. For example, the composition of the soda-lime glass comprisesSiO₂ (74%), Na₂O (13%), CaO (10.5%), Al₂O₃ (1.3%), K₂O (0.3%), SO3(0.2%), MgO (0.2%), Fe2O3 (0.04%), TiO2 (0.01%), the composition of theboro-silicate glass comprises SiO₂ (81%), B₂O₃ (12%), Na₂O (4.5%), Al₂O₃(2.0%), the composition of the phosphate glasses comprises a percentageof the P₂O₅ material between 3% and 10% or between 5% and 20%.

A glass, once formed into a solid body, is capable of being softened andperhaps remitted into a liquid form. The “glass transition temperature”of a glass material is a temperature below which the physical propertiesof the glass are similar to those of a solid and above which the glassmaterial behaves like a liquid.

If a glass is sufficiently below the glass transition temperature,molecules of the glass may have little relative mobility. As a glassapproaches the glass transition temperature, the glass may begin tosoften and with increasing temperature the glass will ultimately meltinto the liquid state. Thus, a glass body may be softened to an extentsufficient to enable manipulation of the body's shape, allowing for theformation of holes or other features in the glass body. Once the desiredform is obtained, glass is usually annealed for the removal of stresses.Surface treatments, coatings or lamination may follow to improve thechemical durability (glass container coatings, glass container internaltreatment), strength (toughened glass, bulletproof glass, windshields),or optical properties (insulated glazing, anti-reflective coating).

Furthermore, the glass layer 16 may be replaced by a polymer layer. Whenthe polymer cured to a solid state. The polymer layer has an expansioncoefficient between 3 and 10 ppm/° C.

Next, referring to FIG. 6h , the mold 10 and the tank 14 are removed andcut the traces 6 from net 2.

Next, referring to FIG. 6i , the net 4 and the thermal resistance layer8 are removed, and then a column 25 is produced.

Next, referring to FIG. 6j , the traces 6 out of the column 25 areremoved and cutting the column 25 to produce multiple first substrates20, wherein the first substrate 20 has a thickness between 20 and 100micrometers, between 50 and 150 micrometers, between 100 and 300micrometers or between 150 and 2000 micrometers or greater than 1000micrometers. The first substrates 20 may be make a planarization processusing a suitable process, such as a chemical mechanical polishing (CMP)procedure, mechanical grinding, or laser drilling

Next, referring to FIG. 6k , the first substrate 20 comprises multiplesecond substrates 22. The second substrates 22 are well-regulated anarray in the first substrate 20. Each of the second substrates 22 hasmultiple metal plugs 21, wherein the metal plug 21 is formed from metaltraces 6. The metal plug 21 has the same material and structure withmetal trace 6.

Next, referring to FIG. 6l-6n , the metal plugs 21 may be arrangeddifferent types, such as FIG. 6l , the metal plugs 21 are arranged onthe side portions of the second substrate 22, or such as FIG. 6m , themetal plugs 21 are arranged on the side portions and center portion ofthe second substrate 22, or such as FIG. 6n , some portions of thesecond substrate 22 are not arranged the metal plugs 21.

FIG. 7a-7m are illustrated a 2^(nd) process of forming a glass substrateof the invention. Please referring to FIG. 7a-7b , there is illustrateda first metal plate 7 in FIG. 7a , illustrated a three-dimensional viewof the first metal plate 7 in FIG. 7b . The first metal plate 7 has athickness between 25 micrometers and 1000 micrometers, between 20micrometers and 500 micrometers, between 30 micrometers and 400micrometers or between 20 micrometers and 250 micrometers. The firstmetal plate 7 comprising a first portion 71, a second portion 73 and athird portion 75 between the first portion 71 and second portion 73,wherein the third portion 75 comprises multiple non-circular metaltraces 752 are connected to the first portion 71 and the second portion73, wherein a cross-section view of the non-circular trace 752comprising a square shape or a rectangle shape. One of the non-circulartrace 752 has a width greater than the thickness of one of thenon-circular trace 752, such as between 150 micrometers and 3000micrometers, between 300 micrometers and 1500 micrometers, between 200micrometers and 800 micrometers or between 100 micrometers and 500micrometers. Multiple gaps 754 are between each two non-circular traces752, wherein the gap 754 is between 50 micrometers and 3000 micrometers,between 300 micrometers and 1500 micrometers, between 200 micrometersand 800 micrometers or between 150 micrometers and 500 micrometers. Thefirst metal plate 7 comprises a copper metal layer, copper-gold alloymetal layer, copper-gold-palladium alloy metal layer, copper-gold-silveralloy metal layer, copper-platinum alloy metal layer, copper-iron alloymetal layer, copper-nickel alloy metal layer, copper-tungsten metallayer, tungsten metal layer, brass metal layer, zinc plated brass metallayer, stainless metal layer, nickel plated stainless metal layer,phosphor bronze metal layer, copper plated the aluminum metal layer oraluminum metal layer. There are two holes 71 a in the first portion 71,wherein the hole 71 a has a diameter between 600 micrometers and 2000micrometers, between 1000 micrometers and 3000 micrometers or between2000 micrometers and 5000 micrometers. There are two holes 73 acorresponding to the hole 71 a in the first portion 71, wherein the hole73 a has a diameter between 600 micrometers and 2000 micrometers,between 1000 micrometers and 3000 micrometers or between 2000micrometers and 5000 micrometers, wherein a first least distance betweenthe two holes 71 a is substantially the same to a second least distancebetween the two holes 73 a.

Next, referring to FIG. 7c-7d , there is illustrated a second metalplate 9 in FIG. 7c , illustrated a three-dimensional view of the secondmetal plate 9 in FIG. 7d . The second metal plate 9 has a thicknessbetween 25 micrometers and 600 micrometers, between 20 micrometers and300 micrometers, between 30 micrometers and 250 micrometers or between25 micrometers and 180 micrometers. There are two holes 90 a in thesecond metal plate 9, wherein the hole 90 a has a diameter between 600micrometers and 2000 micrometers, between 1000 micrometers and 3000micrometers or between 2000 micrometers and 5000 micrometers, wherein athird least distance between the two holes 90 a is substantially thesame to a second least distance between the two holes 73 a andsubstantially the same to the first least distance between the two holes71 a. The second metal plate 9 comprises a copper metal layer,copper-gold alloy metal layer, copper-gold-palladium alloy metal layer,copper-gold-silver alloy metal layer, copper-platinum alloy metal layer,copper-iron alloy metal layer, copper-nickel alloy metal layer,copper-tungsten metal layer, tungsten metal layer, brass metal layer,zinc plated brass metal layer, stainless metal layer, nickel platedstainless metal layer, phosphor bronze metal layer, copper plated thealuminum metal layer or aluminum metal layer.

Next, referring to FIG. 7e , there is illustrated a three-dimensionalview of a third metal plate 11 in FIG. 7e . The third metal plate 11 hasa thickness between 25 micrometers and 600 micrometers, between 20micrometers and 300 micrometers, between 30 micrometers and 250micrometers or between 25 micrometers and 180 micrometers. There arefour holes 110 a, 112 a, 114 a, 116 a in the third metal plate 11,wherein the hole 110 a, 112 a, 114 a, 116 a have a diameter between 600micrometers and 2000 micrometers, between 1000 micrometers and 3000micrometers or between 2000 micrometers and 5000 micrometers, wherein afourth least distance between the two hole 110 a and hole 112 a and afifth least distance between the two hole 114 a and hole 116 a aresubstantially the same to a second least distance between the two holes73 a and substantially the same to the first least distance between thetwo holes 71 a. The third metal plate 11 comprises a copper metal layer,copper-gold alloy metal layer, copper-gold-palladium alloy metal layer,copper-gold-silver alloy metal layer, copper-platinum alloy metal layer,copper-iron alloy metal layer, copper-nickel alloy metal layer,copper-tungsten metal layer, tungsten metal layer, brass metal layer,zinc plated brass metal layer, stainless metal layer, nickel platedstainless metal layer, phosphor bronze metal layer, copper plated thealuminum metal layer or aluminum metal layer.

Next, referring to FIG. 7f -FIG. 7i , providing two bolts 130, 132 passthrough two holes 150 a of a fixing metal plate 150 and providing twobolts 134, 136 pass through two holes 152 a of a fixing metal plate 152respectively. Next, the bolts 130, 132, 134, 136 are passing through theholes 110 a, 112 a, 114 a, 116 a of the third metal plate 11respectively and the third metal plate 11 is formed on the fixing metalplate 150 and the fixing metal plate 152. Next, the bolts 130, 132 arepassing through the hole 90 a of the second metal plate 9 and the bolts134, 136 are passing through the hole 90 a of another the second metalplate 9, then the second metal plates 9 are formed on the third metalplate 11. Next, the bolts 130, 132, 134, 136 are passing through theholes 71 a, 73 a of the first metal plate 7 respectively and the firstmetal plate 7 is formed on the second metal plates 9. Next, repeating tosite another the second metal plates 9 on another the first metal plate7 sequentially until to expose a top of the bolts 130, 132, 134, 136.Next, the top of the bolts 130, 132, 134, 136 are passing through theholes 110 a, 112 a, 114 a, 116 a of another the third metal plate 11respectively and the third metal plate 11 is formed on the second metalplates 9. Next, The top of the bolts 130, 132 are passing through twoholes 150 a of another the fixing metal plate 150 and the top of thebolts 134, 136 are passing through two holes 152 a of another the fixingmetal plate 152 respectively, then the fixing metal plates 150, 152 areformed on the third metal plate 11. Finally, providing four sleeve nuts17 lock on the top of the bolts 130, 132, 134, 136. Then, multiple thefirst metal plates 7, multiple the second metal plates 9, two the thirdmetal plates 11, two fixing metal plates 150 and two fixing metal plates152 forming a metal trace block 19.

Next, referring to FIG. 7j the metal trace block 19 is put in a mold 23.The mold 23 may be a metal mold, a ceramics mold or a polymer mold,which has a heat deflection temperature between 400° C. and 900° C. orbetween 800° C. and 1300° C. The mold 23 comprises a gas inlet 23 a anda liquid input 23 b, wherein the gas inlet 23 a is used to input N₂ gasand the liquid input 23 b is used to input the liquid form glass layer.

Next, referring to FIG. 7k , the glass layer (liquid form) 16 fill inthe mold 23. The glass layer 16 is a high temperature liquid and fill inthe mold 23, and then the glass layer 16 down to a suitable temperaturebecomes a solid state, wherein the glass layer 16 has a glass transitiontemperature between 300° C. and 900° C., between 500° C. and 800° C.,between 900° C. and 1200° C. or between 1000° C. and 1800° C. The glasslayer 16 is a low melting point glass material, wherein the glass layer16 has a melting point between 300° C. and 900° C., 800° C. and 1300°C., between 900° C. and 1600° C., between 1000° C. and 1850° C., orbetween 1000° C. and 2000° C., wherein the melting point may smallerthan 1500° C. Furthermore, there is a few bubbles or no bubble in glasslayer 16, for example, there is zero to 3 bubbles in one cubic meter ofthe glass layer 16, 1 to 10 bubbles in one cubic meter of the glasslayer 16, 5 to 30 bubbles in one cubic meter of the glass layer 16 or 20to 60 bubbles in one cubic meter of the glass layer 16, wherein thebubble has a diameter between 0.0001 and 0.001 centimeters, between0.001 and 0.05 centimeters, between 0.05 and 0.1 centimeters or between0.05 and 0.5 centimeters. The glass layer 16 may be remove bubblesthrough multiple laminating process, squeezing process and heatingprocess.

Next, referring to FIG. 7l , the mold 23 is removed and cut the glasslayer 16 along a cutting line 16 a to remove the fixing metal plate 150,the fixing metal plate 152, the first portion 71 of the first metalplate 7, the second portion 73 of the first metal plate 7 and two thethird metal plates 11, and then the column 25 is produced, showed in theFIG. 7 m.

Next, referring to FIG. 7n , cutting the column 25 to produce multiplefirst substrates 20, wherein the first substrate 20 has a thicknessbetween 20 and 100 micrometers, between 50 and 150 micrometers, between100 and 300 micrometers or between 150 and 2000 micrometers or greaterthan 1000 micrometers. The first substrates 20 may be make aplanarization process using a suitable process, such as a chemicalmechanical polishing (CMP) procedure, mechanical grinding, or laserdrilling.

Next, referring to FIG. 7o , the first substrate 20 comprises multiplesecond substrates 22. The second substrates 22 are well-regulated anarray in the first substrate 20. Each of the second substrates hasmultiple metal plugs 21, wherein the metal plug 21 is formed from thenon-circular metal traces 752. The metal plug 21 has the same material,structure and shape with the non-circular metal traces 752. A firstpitch 21 a and a second pitch 21 b is between the metal plugs 21,wherein the first pitch 21 a is controlled or the same-2 by a distanceof the gap 754 and wherein the second pitch 21 b is controlled by adistance of adjacent the non-circular traces 752.

Next, referring to FIG. 7p-7r , the metal plugs 21 may be arrangeddifferent types, such as FIG. 7p , the metal plugs 21 are arranged onthe side portions of the second substrate 22, or such as FIG. 7q , themetal plugs 21 are arranged on the side portions and center portion ofthe second substrate 22, or such as FIG. 7r , some portions of thesecond substrate 22 are not arranged the metal plugs 21.

FIG. 8a illustrates a cross-section view of the second substrate 22illustrates a cross-section view of the metal plug 21. The secondsubstrate 22 comprise an amorphous solid glass layer/body 16 andmultiple metal plugs 21, wherein the amorphous solid glass layer/body 16having a top surface and an opposing bottom surface and the metal plugs21 extending through the amorphous solid glass layer/body 16 beginningat the top surface and ending at the bottom surface. The top surface ofthe metal plugs 21 are the same area as the bottom surface of the metalplugs 21.

Please referring FIG. 8b , the top surface of the metal plugs 21 and thetop surface of the amorphous solid glass layer/body 16 are substantiallycoplanar. The bottom surface of the metal plugs 21 and the bottomsurface of the amorphous solid glass layer/body 16 are substantiallycoplanar.

Please referring FIG. 8c , the top surface of the metal plugs 21comprises a top surface of the metal traces 6/metal traces 752 and a topsurface of the first covering layer 6 a are substantially coplanar withthe top surface of the amorphous solid glass layer/body 16. The bottomsurface of the metal plugs 21 comprises a bottom surface of the metaltraces 6/metal traces 752 and a bottom surface of the first coveringlayer 6 a are substantially coplanar with the bottom surface of theamorphous solid glass layer/body 16.

Please referring FIG. 8d , the top surface of the metal plugs 21comprises a top surface of the metal traces 6/metal traces 752, a topsurface of the first covering layer 6 a and a top surface of the secondcovering layer 6 b are substantially coplanar with the top surface ofthe amorphous solid glass layer/body 16. The bottom surface of the metalplugs 21 comprises a bottom surface of the metal traces 6/metal traces752, a bottom surface of the first covering layer 6 a and a bottomsurface of the second covering layer 6 b are substantially coplanar withthe bottom surface of the amorphous solid glass layer/body 16.

FIG. 9a -FIG. 9t illustrates a process to form multiple traces on a topsurface and a bottom surface of the first substrate 20.

Next, referring to FIG. 9a , a first dielectric layer 24 is formed onthe top surface of the first substrate 20, wherein the first dielectriclayer 24 may include or may be a layer of silicon oxide (such as SiO₂),silicon nitride (such as Si₃N₄), silicon oxynitride (such as SiON),silicon oxycarbide (such as SiOC), phosphosilicate glass (PSG), siliconcarbon nitride (such as SiCN), low k dielectric layer (K between 0.5 and3), or polymer (such as polyimide, benzocyclobutene (BCB),polybenzoxazole (PBO), poly-phenylene oxide (PPO), epoxy, or silosane).The first dielectric layer 24 may be formed or deposited using asuitable process. The first dielectric layer 24 has a thickness between0.3 and 5 micrometers, between 2 and 10 micrometers, between 1 and 30micrometers or greater than 30 micrometers.

Next, referring to FIG. 9b , multiple openings 24 a are formed in thefirst dielectric layer 24 to expose the metal plugs 21. The openings 24a may be formed in the first dielectric layer 24 by a suitable process,such as etching. The opening 24 a has a width between 0.3 and 3micrometers, between 0.5 and 8 micrometers, between 2 and 20 micrometersor between 2 and 50 micrometers.

Next, referring to FIG. 9c , a first metal layer 26 is formed on thefirst dielectric layer 24, on the metal plugs 21 and in the openings 24a. The first metal layer 26 may include an adhesion/barrier layer, suchas a layer of titanium, a titanium-tungsten alloy, titanium nitride,chromium, tantalum, tantalum nitride, nickel or nickel vanadium formedusing a suitable process, such as vacuum deposition, Physical VaporDeposition (PVD), Plasma Enhanced Chemical Vapor Deposition (PECVD),sputtering process or an electroplating process, with a thickness, e.g.,between 1 nanometer and 2 micrometers, between 0.3 and 3 micrometers orbetween 0.5 and 10 micrometers.

Next, referring to FIG. 9d , a second metal layer 28 is formed on thefirst metal layer 26. The second metal layer 28 may be comprises copper,nickel, gold or aluminum formed using a suitable process, such as vacuumdeposition, Physical Vapor Deposition (PVD), Plasma Enhanced ChemicalVapor Deposition (PECVD), sputtering process or an electroplatingprocess, with a thickness, e.g., between 1 nanometer and 5 micrometers,between 1 and 5 micrometers or between 5 and 30 micrometers.

Next, referring to FIG. 9e , a photoresist layer 30 is formed on thesecond metal layer 28 by using a suitable process, such as spin coatingprocess or lamination process. Next, a photo exposure process using a 1×stepper and a development process using a chemical solution can beemployed to form multiple openings 30 a, exposing the second metal layer28, in the photoresist layer. The photoresist layer 30 may have athickness, e.g., between 3 and 50 micrometers, wherein the photoresistlayer 30 may be a positive-type photo-sensitive resist layer ornegative-type photo-sensitive resist layer.

Next, referring to FIG. 9f , remove the first metal layer 26 and thesecond metal layer 28 are under the openings 30 a by using a suitableprocess, such as an etching process.

Next, referring to FIG. 9g , remove the photoresist layer 30 by using aclean process.

Next, referring to FIG. 9h , a second dielectric layer 32 is formed onthe first dielectric layer 24 and on the second metal layer 28, whereinthe second dielectric layer 32 may include or may be a layer of siliconoxide (such as SiO₂), silicon nitride (such as Si₃N₄), siliconoxynitride (such as SiON), silicon oxycarbide (such as SiOC),phosphosilicate glass (PSG), silicon carbon nitride (such as SiCN), lowk dielectric layer (K between 0.5 and 3), or polymer (such as polyimide,benzocyclobutene (BCB), polybenzoxazole (PBO), poly-phenylene oxide(PPO), epoxy, or silosane). The second dielectric layer 32 may be formedor deposited using a suitable process. The second dielectric layer 32has a thickness between 0.3 and 5 micrometers, between 2 and 10micrometers, between 1 and 30 micrometers or greater than 30micrometers.

Next, referring to FIG. 9i , multiple openings 32 a are formed in thesecond dielectric layer 32 to expose the second metal layer 28. Theopenings 32 a may be formed in the second dielectric layer 32 by asuitable process, such as etching. The opening 32 a has a width between0.3 and 3 micrometers, between 0.5 and 8 micrometers, between 2 and 20micrometers or between 2 and 50 micrometers.

Next, referring to FIG. 9j , a third metal layer 34 is formed on thesecond dielectric layer 32, on the second metal layer 28 and in theopenings 32 a. The third metal layer 34 may include an adhesion/barrierlayer, such as a layer of titanium, a titanium-tungsten alloy, titaniumnitride, chromium, tantalum, tantalum nitride, nickel or nickel vanadiumformed using a suitable process, such as vacuum deposition, PhysicalVapor Deposition (PVD), Plasma Enhanced Chemical Vapor Deposition(PECVD), sputtering process or an electroplating process, with athickness, e.g., between 1 nanometer and 2 micrometers, between 0.3 and3 micrometers or between 0.5 and 10 micrometers.

Next, referring to FIG. 9k , a fourth metal layer 36 is formed on thethird metal layer 34. The fourth metal layer 36 may be comprises copper,nickel, gold or aluminum formed using a suitable process, such as vacuumdeposition, Physical Vapor Deposition (PVD), Plasma Enhanced ChemicalVapor Deposition (PECVD), sputtering process or an electroplatingprocess, with a thickness, e.g., between 1 nanometer and 5 micrometers,between 1 and 5 micrometers or between 5 and 30 micrometers.

Next, referring to FIG. 9l , a photoresist layer 38 is formed on thefourth metal layer 36 by using a suitable process, such as spin coatingprocess or lamination process. Next, a photo exposure process using a 1×stepper and a development process using a chemical solution can beemployed to form multiple openings 38 a, exposing the fourth metal layer36, in the photoresist layer. The photoresist layer 38 may have athickness, e.g., between 3 and 50 micrometers, wherein the photoresistlayer 38 may be a positive-type photo-sensitive resist layer ornegative-type photo-sensitive resist layer.

Next, referring to FIG. 9m , remove the third metal layer 34 and thefourth metal layer 36 are under the openings 38 a by using a suitableprocess, such as an etching process.

Next, referring to FIG. 9n , remove the photoresist layer 38 by using aclean process.

Next, referring to FIG. 9o , a third dielectric layer 40 is formed onthe second second dielectric layer 32 and on the fourth metal layer 36,wherein the third dielectric layer 40 may include or may be a layer ofsilicon oxide (such as SiO₂), silicon nitride (such as Si₃N₄), siliconoxynitride (such as SiON), silicon oxycarbide (such as SiOC),phosphosilicate glass (PSG), silicon carbon nitride (such as SiCN), lowk dielectric layer (K between 0.5 and 3), or polymer (such as polyimide,benzocyclobutene (BCB), polybenzoxazole (PBO), poly-phenylene oxide(PPO), epoxy, or silosane). The third dielectric layer 40 may be formedor deposited using a suitable process. The third dielectric layer 40 hasa thickness between 0.3 and 5 micrometers, between 2 and 10 micrometers,between 1 and 30 micrometers or greater than 30 micrometers.

Next, referring to FIG. 9p , multiple openings 40 a are formed in thethird dielectric layer 40 to expose the fourth metal layer 36. Theopenings 40 a may be formed in the third dielectric layer 40 by asuitable process, such as etching. The opening 40 a has a width between0.3 and 3 micrometers, between 0.5 and 8 micrometers, between 2 and 20micrometers or between 2 and 50 micrometers.

Next, referring to FIG. 9q , a protecting layer 42 is formed in theopenings 40 a, on the third dielectric layer 40 and on the fourth metallayer 36, which can protect the third dielectric layer 40 not to bedamaged and the fourth metal layer 36 not be damaged and oxidated.

Next, referring to FIG. 9r , repeat the processes of FIG. 9a -FIG. 9p toform the first dielectric layer 24, the first metal layer 26, the secondmetal layer 28, the second dielectric layer 32, the third metal layer34, the fourth metal layer 36 and the third dielectric layer 40 on thebottom surface of the first substrate 20.

Furthermore, referring to FIG. 9s , a passive device 44 may be formed inthe first metal layer 28 and the second metal layer 36, such as aninductor, a capacitor or a resistor.

Next, referring to FIG. 9t , multiple chips 46 and chips 56 set up overthe third dielectric layer 40 through a flip chip package process or awirebonding package process, wherein the chip 46 and 56 comprises may bea memory chip, such as NAND-Flash memory chip, Flash memory chip, DRAMchip, SRAM chip or SDRAM chip, a central-processing-unit (CPU) chip, agraphics-processing-unit (GPU) chip, a digital-signal-processing (DSP)chip, a baseband chip, a wireless local area network (WLAN) chip, alogic chip, an analog chip, a global-positioning-system (GPS) chip, a“Bluetooth” chip, or a chip including one or more of a CPU circuitblock, a GPU circuit block, a DSP circuit block, a memory circuit block(such as DRAM circuit block, SRAM circuit block, SDRAM circuit block,Flash memory circuit block, or NAND-Flash memory circuit block), abaseband circuit block, a Bluetooth circuit block, a GPS circuit block,a MEMS chip, a COMS image sensor device, a WLAN circuit block, and amodem circuit block, from the semiconductor wafer.

The chips 46 are set up on the third dielectric layer 40 through a flipchip package process, wherein the chip 46 comprises multiple metal pads48 and multiple metal bumps 50 formed on the metal pads 48. The metalpad 48 may be an electroplated copper pad, a damascene copper pad or analuminum pad. The metal bump 50 comprises an adhesion/barrier metallayer formed on the metal pad 48, an electroplated metal layer or anelectro-less metal layer formed on the adhesion/barrier metal layer,wherein the adhesion/barrier metal layer comprises a titanium-containinglayer, a chromium-containing layer, a tantalum-containing layer or anickel layer, and the electroplated metal layer comprises a copperlayer, a gold layer, a nickel layer, a tin-containing layer, a solderlayer, a solder layer over a nickel layer and a copper layer, and theelectro-less layer comprises a copper layer, a gold layer or a nickellayer. The electroplated metal layer has a thickness between 2 and 5micrometers, between 5 and 30 micrometers or between 10 and 50micrometers. The metal bumps 50 are connected to the fourth metal layer36 exposed by the openings 40 a through a solder layer 54, wherein thesolder layer 54 is formed on the fourth metal layer 36 exposed by theopenings 40 a or is a portion of the metal bump 50. An underfill layer52 is formed between the chips 46 and the third dielectric layer 40.

The chips 56 are set up over the third dielectric layer 40 through apolymer adhesion layer 60, wherein the chip 56 comprises multiple metalpads 58. The metal pad 58 may be an electroplated copper pad, adamascene copper pad or an aluminum pad. Multiple metal wires 62 areconnected to the metal pads 58 and the fourth metal layer 36 exposed bythe openings 40 a, wherein the metal wires 62 comprises a gold wire, acopper wire, a metal alloy wire, a silver-containing wire, analuminum-containing wire or gold-copper alloy wire. An underfill layer64 is covered the chip 56, metal wires 62 and the metal pads 58.

Multiple discrete passive components 66 set up on the third dielectriclayer 40, such as a discrete inductor, a discrete capacitor or adiscrete resistor, wherein the discrete passive component 66 comprises amultiple metal pad 68. The discrete passive components 66 mounted on thethird dielectric layer 40 through a solder layer 70.

Next, referring to FIG. 9u , multiple metal bumps 72 are formed on thebottom surface of the substrate 20.

FIG. 9v is disclosed some structures of metal bump 72.

-   -   Lift side: 1^(st) type of structures of metal bump 72 comprises        an adhesion/barrier metal layer 61 formed on the metal pad 48, a        metal seed layer 63 formed on the adhesion/barrier metal layer        61, an electroplated metal layer 65 formed on the metal seed        layer 63 and a solder layer 67 formed on the electroplated metal        layer 65, wherein the adhesion/barrier metal layer 61 comprises        a titanium-containing layer, a chromium-containing layer, a        tantalum-containing layer or a nickel layer, wherein the first        electroplated metal layer 65 comprises a copper layer, a gold        layer, a nickel layer, wherein the solder layer 67 can be formed        by screen plating, ball mounting, or an electroplating process,        such as gold-tin alloy, tin-silver alloy, tin-silver-copper        alloy, indium, tin-bismuth alloy, or other lead-free alloy. Lead        alloy solders can also be used but may be less desirable in some        embodiments due to toxicity considerations. The adhesion/barrier        metal layer 61 has a thickness between 0.05 and 2 micrometers.        The metal seed layer 63 has a thickness between 0.05 and 2        micrometers. The first electroplated metal layer 65 has a        thickness between 1 and 5 micrometers, between 2 and 8        micrometers or between 5 and 20 micrometers. The solder layer 67        has a thickness between 30 and 80 micrometers, between 50 and        100 micrometers, between 80 and 150 micrometers or between 120        and 350 micrometers.    -   Right side: 2^(nd) type of structure of metal bump 72 comprises        an adhesion/barrier metal layer 61 formed on the metal pad 48, a        metal seed layer 63 formed on the adhesion/barrier metal layer        61, a first electroplated metal layer 65 formed on the metal        seed layer 63 and a second electroplated metal layer 69 formed        on the first electroplated metal layer 65, wherein the        adhesion/barrier metal layer 61 comprises a titanium-containing        layer, a chromium-containing layer, a tantalum-containing layer        or a nickel layer, wherein the first electroplated metal layer        65 comprises a copper layer, a gold layer, a nickel layer,        wherein the second electroplated metal layer 69 comprises a        copper layer, a gold layer, a nickel layer. The adhesion/barrier        metal layer 61 has a thickness between 0.05 and 2 micrometers.        The metal seed layer 63 has a thickness between 0.05 and 2        micrometers. The first electroplated metal layer 65 has a        thickness between 1 and 5 micrometers, between 2 and 4        micrometers, between 5 and 15 micrometers or between 10 and 25        micrometers. The second electroplated metal layer 69 has a        thickness between 1 and 5 micrometers, between 2 and 4        micrometers, between 10 and 30 micrometers or between 20 and 60        micrometers.

Furthermore, referring to FIG. 9w , the chips 46 may be set up on thebottom surface of the first substrate 20.

Furthermore, referring to FIG. 9x , the chip 46 may be replaced a 3D ICchip package, wherein the chip 46 comprises a multiple metal pad 48formed on the top and bottom surface. The metal pads 48 of the topsurface of the chip 46 are connected to the metal pads 48 of the bottomsurface of the chip 46 through multiple through-silicon-via metallayers. A chip 47 is connected to the 3D IC chip 46 through the flipchip package process, wherein the chip 47 comprises multiple metal pads49, wherein the metal pad 49 may be an electroplated copper pad, adamascene copper pad or an aluminum pad. The metal pads 49 are connectedto the metal pads 48 through a solder layer 51.

FIG. 9y , illustrates a top view of the first substrate 20. FIG. 9u-FIG. 9w illustrate a cross section view of Line L-L′ in FIG. 9y .Multiple the chips 46, the chips 56 and the passive components 66 mayalso be provided in or on the first substrate 20.

Next, cutting the first substrate 20 to produce multiple secondsubstrates 22.

FIG. 10a -FIG. 10j illustrates a damascene process to form the firstmetal layer 26, the second metal layer 28, the third metal layer 34 andthe fourth metal layer 36 on a top surface and a bottom surface of thefirst substrate 20.

Referring to FIG. 10a , the dielectric layers 24 in FIGS. 9a include twodielectric layers 80 and 82. The dielectric layer 80 is formed on thedielectric layer 82 by a chemical vapor deposition (CVD) process or aspin-on coating process, wherein each of the dielectric layers 80 and 82may be composed of a low-K oxide layer with a thickness of between 0.3and 5 μm, and preferably of between 0.5 and 3 μm, and an oxynitridelayer on the low-K oxide layer, of a low-K polymer layer with athickness of between 0.3 and 5 μm, and preferably of between 0.5 and 3μm, and an oxynitride layer on the low-K polymer layer, of a low-K oxidelayer with a thickness of between 0.3 and 5 μm, and preferably ofbetween 0.5 and 3 μm, and a nitride layer on the low-K oxide layer, of alow-K polymer layer with a thickness of between 0.3 and 5 μm, andpreferably of between 0.5 and 3 μm, and a nitride layer on the low-Kpolymer layer, or of a low-K dielectric layer with a thickness ofbetween 0.3 and 5 μm, and preferably of between 0.5 and 3 μm, and anitride-containing layer on the low-K dielectric layer. Next, referringto FIG. 10b , a photoresist layer 84 is formed on the dielectric layer82, an opening 84 a in the photoresist layer 84 exposing the dielectriclayer 82. Next, referring to FIG. 10c , the dielectric layer 82 underthe opening 84 a is removed by a dry etching method to form a trench inthe dielectric layer 82 exposing the dielectric layer 80. Next,referring to FIG. 10d , after forming the trench in the dielectric layer82, the photoresist layer 84 is removed. Next, referring to FIG. 10e , aphotoresist layer 86 is formed on the dielectric layer 82 and on thedielectric layer 80 exposed by the trench, an opening 86 a in thephotoresist layer 86 exposing the dielectric layer 80 exposed by thetrench. Next, referring to FIG. 19f , the dielectric layer 80 under theopening 86 a is removed by a dry etching method to form a via 80 a inthe dielectric layer 80 exposing the metal plugs 21 in the substrate 20.Next, referring to FIG. 10g , after forming the via 80 a in thedielectric layer 80, the photoresist layer 86 is removed. Thereby, anopening 88 including the trench and the via 80 a is formed in thedielectric layers 82 and 80. Next, referring to FIG. 10h , anadhesion/barrier layer 90 having a thickness of between 0.1 and 3micrometers is formed on the metal plugs 21 exposed by the opening 88,on the sidewalls of the opening 88 and on the top surface of thedielectric layer 82. The adhesion/barrier layer 90 can be formed by asputtering process or a chemical vapor deposition (CVD) process. Thematerial of the adhesion/barrier layer 90 may include titanium, titaniumnitride, a titanium-tungsten alloy, tantalum, tantalum nitride, or acomposite of the abovementioned materials. For example, theadhesion/barrier layer 90 may be formed by sputtering a tantalum layeron the metallization structure exposed by the opening 88, on thesidewalls of the opening 88 and on the top surface of the dielectriclayer 82. Alternatively, the adhesion/barrier layer 90 may be formed bysputtering a tantalum-nitride layer on the metallization structureexposed by the opening 88, on the sidewalls of the opening 88 and on thetop surface of the dielectric layer 82. Alternatively, theadhesion/barrier layer 90 may be formed by forming a tantalum-nitridelayer on the metallization structure exposed by the opening 88, on thesidewalls of the opening 88 and on the top surface of the dielectriclayer 82 by a chemical vapor deposition (CVD) process. Next, referringto FIG. 10i , a seed layer 92, made of copper, having a thickness ofbetween 0.1 and 3 micrometers is formed on the adhesion/barrier layer 90using a sputtering process or a chemical vapor deposition (CVD) process,and then a copper layer 94 having a thickness of between 0.5 and 5 μm,and preferably of between 1 and 2 μm, is electroplated on the seed layer92. Next, referring to FIG. 10j , the copper layer 94, the seed layer 92and the adhesion/barrier layer 90 outside the opening 88 in thedielectric layers 82 and 80 are removed using a chemical mechanicalpolishing (CMP) process until the top surface of the dielectric layer 82is exposed to an ambient.

FIG. 11a -FIG. 11i illustrates an embossing process to form the firstmetal layer 26, the second metal layer 28, the third metal layer 34 andthe fourth metal layer 36 on a top surface and a bottom surface of thefirst substrate 20.

Referring to FIG. 11a , the metal plugs 21 are in the glass layer 16 ofthe first substrate 20, and the opening 96 a in the dielectric layer 96exposes the metal plugs 21.

Referring to FIG. 11a , a polymer layer 98 can be formed on thedielectric layer 96, and at least one opening 98 a is formed in thepolymer layer 98 by patterning the polymer layer 98 to expose at leastone metal trace 6, as shown in FIG. 11b and FIG. 11c . The metal plugs21 may include a center portion exposed by an opening 98 a and aperipheral portion covered with the polymer layer 98, as shown in FIG.11b . Alternatively, the opening 98 a may expose the entire uppersurface of the metal plugs 21 exposed by the opening 96 a in thedielectric layer 96 and further may expose the upper surface of thedielectric layer 96 near the metal trace 6, as shown in FIG. 11 c.

The material of the polymer layer 98 may include benzocyclobutane (BCB),polyimide (PI), polyurethane, epoxy resin, a parylene-based polymer, asolder-mask material, an elastomer, or a porous dielectric material. Thepolymer layer 98 has a thickness of between 3 and 25 μm or between 5 and50 micrometers.

The polymer layer 98 can be formed by a spin-on coating process, alamination process or a screen-printing process. Below, the process offorming a patterned polymer layer 98 is exemplified with the case ofspin-on coating a polyimide layer on the dielectric layer 96 and thenpatterning the polyimide layer.

Referring to FIG. 11d , an adhesion/barrier layer 100 having a thicknessof between 0.1 and 3 micrometers, and preferably between 0.5 and 2micrometers, is formed on the polymer layer 98 and on the metal plugs21. The adhesion/barrier layer 100 may be a titanium-tungsten-alloylayer, tantalum-containing layer, a chromium-containing layer or atitanium-nitride layer. The adhesion/barrier layer 100 may be formed bya sputtering method, an evaporation method, or a chemical vapordeposition (CVD) method.

Referring to FIG. 11e , a photoresist layer 102 can be formed on theadhesion/barrier layer 100 by a spin coating process or a laminationprocess. Referring to FIG. 11f , the photoresist layer 102 is patternedwith the processes of exposure, development, etc., to form a photoresistopening 102 a on the above-mentioned adhesion/barrier layer 100 over themetal plugs 21 exposed by the opening 98 a.

Referring to FIG. 11g , an electroplated metal layer 104 is formed onthe adhesion/barrier layer 100 in the opening 102 a, wherein theelectroplated metal layer 104 comprises a copper layer, gold layer, anickel layer, has a thickness between 2 and 10 micrometers, between 5and 20 micrometers or between 5 and 35 micrometers.

Referring to FIG. 11h , removing the photoresist layer 102.

Referring to FIG. 11i , the above-mentioned adhesion/barrier layer 100not under the electroplated metal layer 104 is removed with a dryetching method or a wet etching method. For example, theadhesion/barrier layer 100 made of titanium, titanium-tungsten alloy,titanium nitride, tantalum or tantalum nitride, not under theelectroplated metal layer 104 is removed with a reactive ion etching(RIE) process.

First Application: Please referring to FIG. 12, the second substrates 22is connected to a OLED display substrate through COG bonding process,wherein the OLED display substrate comprises a first glass substrate106, a second glass substrate 108, an organic light-emitting diodeslayer 110 (or a polymer light-emitting diodes layer, PLED layer) betweenthe first glass substrate 106 and the second glass substrate 108 andmultiple transparent electrodes 114. The metal bumps 72 are connected tothe transparent electrodes 114 through an anisotropic conductive film(ACF) layer 116, wherein the ACF layer 116 comprises multiple conductiveparticles 117, such as nickel (Ni) particles, gold (Au) particles,nickel-gold alloy particles, silver-tin alloy particles, silverparticles, gold plated particles, silver plated particles or nickelplated particles. The OLED display substrate comprises multiple OLEDdisplay panels. The OLED display substrate may comprise touch screenfunction. A least distance 106 a between a centerline of the metal bump72 and a boundary of the glass substrate 106 is between 3 micrometersand 10 micrometers, 5 micrometers and 15 micrometers, 10 micrometers and25 micrometers or 20 micrometers and 40 micrometers.

Next, cutting the second substrates 22 and the OLED display substrate toproduce multiple package units.

Second Application: Furthermore, the OLED display substrate can bereplaced to a Micro Electro Mechanical Systems (MEMS) display substrate.Please referring to FIG. 13, the second substrates 22 is connected to aMEMS display substrate through COG bonding process, wherein the MEMSdisplay substrate comprises a first glass substrate 106, a MEMS layer109 and multiple transparent electrodes 114 formed on the first glasssubstrate 106. The metal bumps 72 are connected to the transparentelectrodes 114 through an anisotropic conductive film (ACF) layer 116,wherein the ACF layer 116 comprises multiple conductive particles 117,such as nickel (Ni) particles, gold (Au) particles, nickel-gold alloyparticles, silver-tin alloy particles, silver particles, gold platedparticles, silver plated particles or nickel plated particles. The MEMSdisplay substrate comprises multiple MEMS display panels. The MEMSdisplay substrate may comprise touch screen function. A least distance106 a between a centerline of the metal bump 72 and a boundary of theglass substrate 106 is between 3 micrometers and 10 micrometers, 5micrometers and 15 micrometers, 10 micrometers and 25 micrometers or 20micrometers and 40 micrometers.

Next, cutting the second substrates 22 and the MEMS display substrate toproduce multiple package units.

Third application: Please referring to FIG. 14, multiple LED devices 122are packaged on the bottom surface of the second substrates 22. Thesecond substrates 22 is connected to a LCD display substrate through COGbonding process, wherein the LCD display substrate comprises a firstglass substrate 106, a second glass substrate 108, and a transistorliquid crystal display layer 111 between the first glass substrate 106and the second glass substrate 108 and multiple transparent electrodes114. The metal bumps 72 are connected to the electrodes 114 through ananisotropic conductive film (ACF) layer 116, wherein the ACF layer 116comprises multiple conductive particles 117, such as nickel (Ni)particles, gold (Au) particles, nickel-gold alloy particles, silver-tinalloy particles, silver particles, gold plated particles, silver platedparticles or nickel plated particles. The LCD display substratecomprises multiple LCD display panels. The LCD display substrate maycomprise touch screen function, wherein the LCD display substratecomprise an in-cell TFT LCD substrate. There are multiple optical layers128 between the second substrates 22 and LCD display substrate, such asa diffuser sheet layer, a prism sheet layer, a diffuser layer (ordiffuser plate) and a reflector layer. A least distance 106 a between acenterline of the metal bump 72 and a boundary of the glass substrate106 is between 3 micrometers and 10 micrometers, 5 micrometers and 15micrometers, 10 micrometers and 25 micrometers or 20 micrometers and 40micrometers.

Next, cutting the second substrates 22 and the LCD display substrate toproduce multiple package units.

Fourth application: Referring to FIG. 15, this structure of the fourthapplication is similar to the structure of the third application in FIG.14. The second substrates 22 is connected to a LCD display substratethrough flip chip bonding process, wherein the LCD display substratecomprises a first glass substrate 106 and a second glass substrate 108,and a transistor liquid crystal display layer 111 and thin filmtransistor circuit layers (not shown) between the first glass substrate106 and the second glass substrate 108, wherein multiple transparentelectrodes 114 on bottom surface of the first glass substrate 106 andmultiple metal plugs 113 in the first glass substrate 106, wherein themultiple metal plugs 113 are connected to the transparent electrodes 114respectively. The structure of first glass substrate 106 can refer tothe second substrates 22 in the invention. The metal bumps 72 areconnected to the transparent electrodes 114 through a solder layer 107,wherein the solder layer 107 comprises gold-tin alloy, tin-silver alloy,tin-silver-copper alloy, indium, tin-bismuth alloy, or other lead-freealloy. The LCD display substrate comprises multiple LCD display panels.The LCD display substrate may comprise touch screen function, whereinthe LCD display substrate comprising an in-cell TFT LCD substrate. Thereare multiple optical layers 128 between the second substrates 22 and LCDdisplay substrate, such as a diffuser sheet layer, a prism sheet layer,a diffuser layer (or diffuser plate) and a reflector layer. A leastdistance 106 a between a centerline of the metal bump 72 and a boundaryof the glass substrate 106 is between 30 micrometers and 100micrometers, 50 micrometers and 150 micrometers, 100 micrometers and 250micrometers or 50 micrometers and 300 micrometers.

Fifth application: Referring to FIG. 16, this structure of the fifthapplication is similar to the structure of the fourth application inFIG. 14. The organic light-emitting diodes layer 110 (or a polymerlight-emitting diodes layer, PLED layer) is replaced to the liquidcrystal display layer 111. The second substrates 22 is connected to aOLED display substrate through flip chip bonding process, wherein theOLED display substrate comprises a first glass substrate 106 and asecond glass substrate 108, and an organic light-emitting diodes layer110 (or a polymer light-emitting diodes layer, PLED layer) and thin filmtransistor circuit layers (not shown) between the first glass substrate106 and the second glass substrate 108, wherein multiple transparentelectrodes 114 on bottom surface of the first glass substrate 106 andmultiple metal plugs 113 in the first glass substrate 106, wherein themultiple metal plugs 113 are connected to the transparent electrodes 114respectively. The structure of first glass substrate 106 can refer tothe second substrates 22 in the invention. The metal bumps 72 areconnected to the transparent electrodes 114 through a solder layer 107,wherein the solder layer 107 comprises gold-tin alloy, tin-silver alloy,tin-silver-copper alloy, indium, tin-bismuth alloy, or other lead-freealloy. The OLED display substrate comprises multiple OLED displaypanels. The OLED display substrate may comprise touch screen function,wherein the OLED display substrate comprising an in-cell TFT OLEDsubstrate. A least distance 106 a between a centerline of the metal bump72 and a boundary of the glass substrate 106 is between 30 micrometersand 100 micrometers, 50 micrometers and 150 micrometers, 100 micrometersand 250 micrometers or 50 micrometers and 300 micrometers.

Sixth application: Referring to FIG. 17a , the second substrates 22 canbe a port of an OLED display substrate. The OLED display substratecomprises the second substrates 22 and second glass substrate 108, andan organic light-emitting diodes layer 110 (or a polymer light-emittingdiodes layer, PLED layer), thin film transistor circuit layers (notshown) and transparent electrodes 114 between the second substrates 22and second glass substrate 108, wherein the metal plugs 21 connected totransparent electrodes 114 through the first metal layer 26. The OLEDdisplay substrate comprises multiple OLED display panels. The OLEDdisplay substrate may comprise touch screen function, wherein the OLEDdisplay substrate comprising an in-cell TFT OLED substrate.

Referring to FIG. 17b , the structure of the OLED display substratecomprises multiple thin film transistors circuits 700 and multipleorganic light-emitting components 800 between the second substrates 22and second glass substrate 108, wherein the thin film transistorscircuit 700 comprises a buffer layer 702, a first gate electrode 704 aand a first source electrode 704 b formed on the buffer layer 702, afirst insulating layer 706 formed on the first gate electrode 704 a, thefirst source electrode 704 b and the buffer layer 702. An oxidesemiconductor layer 710 is formed on the first insulating layer 706 overthe first gate electrode 704 a and the first source electrode 704 b,wherein the oxide semiconductor layer 710 is connected to the firstsource electrode 704 b through the opening in the first insulating layer706. A second insulating layer 712 is formed on the oxide semiconductorlayer 710. A second gate electrode 714 a and a second source electrode714 b formed on the second insulating layer 712, wherein the secondsource electrode 714 b connected to the oxide semiconductor layer 710through an opening in the second insulating layer 712. A protectionlayer 716 is formed on the second gate electrode 714 a, the secondsource electrode 714 b and the second insulating layer 712. The organiclight-emitting component 800 formed on the protection layer 716 andconnected to the second source electrode 714 b through an opening in theprotection layer 716.

The oxide semiconductor layer 710 comprises a ZnO containing layer,wherein the ZnO containing layer can be doped with a group selected fromthe group constituted of at least one ionic: Gallium (Ga), indium (In),tin (Sn), zirconium (Zr), hafnium (Hf), cadmium (Cd), magnesium (Mg),vanadium (V). The first gate electrode 704 a, the first source electrode704 b, the second gate electrode 714 a and the second source electrode714 b are formed of a metal selected from the following groups: tungsten(W), titanium (Ti), molybdenum (Mo), silver (Ag), tantalum (Ta),aluminum (Al), copper (Cu), gold (Au), chromium (Cr) or niobium (Nb).

The organic light-emitting component 800 comprises an anode layer 802, acathode layer 804 and an organic light-emitting layer 806 between theanode layer 802 and the cathode layer 804, wherein the anode layer 802formed on the protection layer 716 and connected to the second sourceelectrode 714 b. A third insulating layer 808 formed on the protectionlayer 716 and the anode layer 802, then formed a hole/opening in thethird insulating layer 808 and on the anode layer 802. Forming theorganic light-emitting layer 806 in the opening and on the thirdinsulating layer 808, then formed the cathode layer 804 on the thirdinsulating layer 808 and on the organic light-emitting layer 806. Theanode layer 802 is connected to the metal plugs 21 via a conductivelayer formed on the opening through the buffer layer 702, a firstinsulating layer 706 and second insulating layer 712. The cathode layer804 is connected to the metal plugs 21 via a conductive layer formed onthe opening through the buffer layer 702, the first insulating layer706, second insulating layer 712 and third insulating layer 808. Thebuffer layer 702, first insulating layer 706, second insulating layer712 and third insulating layer 808 comprises a polyimide, polyamide,acryl resin, benzocyclobutene, phenol resin, oxide layer (buffer layer702), nitride layer (buffer layer 702).

The anode layer 802 may contain one or more transparent materials suchas indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO),indium gallium oxide (IGO), aluminum zinc oxide (AZO) and In2O3, ornon-transparent materials such as Ag, Mg, Al, Pt, Pd, Au, Ni, Nd, Ir,Cr, Li, Ca, Mo, Ti, W, MoW, and Al/Cu. The cathode layer 804 may containone or more transparent materials such as indium tin oxide (ITO), indiumzinc oxide (IZO), zinc oxide (ZnO), indium gallium oxide (IGO), aluminumzinc oxide (AZO) and In2O3.

The organic light-emitting layer 806 may include a hole transport layer(HTL) and a hole injection layer (HIL) stacked toward the pixelelectrode (anode layer 802 or cathode layer 804), and an electrontransport layer (ETL) and an electron injection layer (EIL) stackedtoward the pixel electrode (anode layer 802 or cathode layer 804).Furthermore, various other layers may be stacked if required. Further,the light-emitting layer 806 comprises a carbazole biphenyl(CBP),(III)(bis(1-phenylisoquinoline)(acetyl acetonate)iridium, PIQIr(acac)),(III)(bis(1-phenylquinoline)(acetylacetonate)iridium, PQIr(acac)),(III)(tris(1-phenylquinoline)iridium (PQIr), octaethylporphyrinplatinum, PtOEP,(III))(tris(dibenzoylmethane)(o-phenanthroline)europium(III),PED:Eu(DBM)3(Phen)), perylene,N,N′-Di(naphthalene-1-yl)-N,N′-diphenyl-benzidine,tris-8-hydroxyquinoline aluminum (PEDOT), copper phthalocyanine, CuPc,4,4′,4″-tris(N-(3-methylphenyl)-N-phenylamino)triphenylamine (MTDATA).

Referring to FIG. 18 and FIG. 19, an outward of display substrateproduced from above first application to sixth application is anunframed display 119, wherein the unframed display 119 comprises adisplay area 119 a has four edges 119 b, wherein a gap between the eachedge 119 b and one of four boundaries of the unframed display 119 has aleast distance smaller than 15 micrometers, 20 micrometers, 30micrometers, 50 micrometers, 100 micrometers, 150 micrometers or 200micrometers. The unframed display 119 is installed in a shell 123 of adisplay device 125. Some components (not showed in drawings) can installin the display device 125 (or installed on the second substrates 22),for example, a speaker component, a battery component, a microphonecomponent, a signal receiver component, a wireless signal receivercomponent, a wireless signal transmitter module.

Referring to FIG. 19, the display device 125 comprises multipleconnecting ports 127 on the shell 123, wherein the connecting ports 127comprise a signal connecting port, a power connecting port, and/or aground connecting port. The display device 125 can connect to anotherone display device 125 b to become a bigger display device 129, whereinthe connecting ports 127 of the display device 125 are connected to theconnecting ports 127 of the display device 125 b. Multiple displaydevices 125 can be combined a big display device, an advertisingbillboards. The display devices 125 can be used as a tile on the wall ofthe building. The display devices 125 can be a display unit on a surfaceof a magic cube.

The structure of the OLED display substrate disclosed in the FIG. 12 andFIG. 16 can be referred to the paragraph [00125] to the paragraph[00131].

Those described above are the embodiments to exemplify the presentdisclosure to enable the person skilled in the art to understand, makeand use embodiments of the present disclosure. This description,however, is not intended to limit the scope of the present disclosure.Any equivalent modification and variation according to the spirit of thepresent disclosure is to be also included within the scope of the claimsstated below.

The components, steps, features, benefits and advantages that have beendiscussed are merely illustrative. None of them, nor the discussionsrelating to them, are intended to limit the scope of protection in anyway. Numerous other embodiments are also contemplated. These includeembodiments that have fewer, additional, and/or different components,steps, features, benefits and advantages. These also include embodimentsin which the components and/or steps are arranged and/or ordereddifferently.

In reading the present disclosure, one skilled in the art willappreciate that embodiments of the present disclosure can be implementedin hardware, software, firmware, or any combinations of such, and overone or more networks. Suitable software can include computer-readable ormachine-readable instructions for performing methods and techniques (andportions thereof) of designing and/or controlling the fabrication anddesign of integrated circuit chips according to the present disclosure.Any suitable software language (machine-dependent ormachine-independent) may be utilized. Moreover, embodiments of thepresent disclosure can be included in or carried by various signals,e.g., as transmitted over a wireless radio frequency (RF) or infrared(IR) communications link or downloaded from the Internet.

Unless otherwise stated, all measurements, values, ratings, positions,magnitudes, sizes, and other specifications that are set forth in thisspecification, including in the claims that follow, are approximate, notexact. They are intended to have a reasonable range that is consistentwith the functions to which they relate and with what is customary inthe art to which they pertain. The scope of protection is limited solelyby the claims. That scope is intended and should be interpreted to be asbroad as is consistent with the ordinary meaning of the language that isused in the claims when interpreted in light of this specification andthe prosecution history that follows and to encompass all structural andfunctional equivalents.

What is claimed is:
 1. A display device comprising: a display panelsubstrate comprises multiple contact pads, a display area, a firstboundary, a second boundary, a third boundary and a fourth boundary,wherein said display area comprises a first edge, a second edge, a thirdedge and a fourth edge, wherein said first boundary is parallel to saidthird boundary and said first and third edges, wherein said secondboundary is parallel to said fourth boundary and said second and fourthedges, wherein a first least distance between said first boundary andsaid first edge, wherein a second least distance between said secondboundary and said second edge, a third least distance between said thirdboundary and said third edge, a fourth distance between said fourthboundary and said fourth edge, and wherein said first, second, third andfourth least distances are smaller than 100 micrometers; and a glasssubstrate over said display panel substrate, wherein said glasssubstrate comprising multiple metal conductors through in said glasssubstrate and multiple metal bumps are between said glass substrate andsaid display panel substrate, wherein said one of said metal conductorsis connected to one of said contact pads through one of said metalbumps.
 2. The display device of claim 1, wherein said display panelsubstrate comprises an OLED display substrate.
 3. The display device ofclaim 1, wherein said display panel substrate comprises a LCD displaysubstrate.
 4. The display device of claim 1, wherein said display panelsubstrate comprises a MEMs display substrate.
 5. The display device ofclaim 1, wherein said display panel substrate comprises multipletransparent electrodes.
 6. The display device of claim 1, wherein saidmetal conductor comprises a copper metal layer.
 7. The display device ofclaim 1, wherein said metal bump comprises a gold metal layer.
 8. Thedisplay device of claim 1, wherein said metal bump comprises a coppermetal layer and gold metal layer over said copper layer.
 9. The displaydevice of claim 1 further comprising a chip formed on said glasssubstrate, wherein a metal pad of said chip is connected to one of saidmetal conductors through a solder metal layer.
 10. The display device ofclaim 1 further comprising a chip formed on said glass substrate,wherein a metal pad of said chip is connected to one of said metalconductors through a metal wire.
 11. The display device of claim 1further comprising a first chip and a second chip formed on said glasssubstrate, wherein a first metal pad of said first chip is connected toone of said metal conductors through a metal wire, wherein a secondmetal pad of said second chip is connected to one of said metalconductors through a solder metal layer.
 12. The display device of claim1 further comprising a metal trace formed on said glass substrate,wherein said metal trace is connected to said metal bump and one of saidmetal conductors.
 13. The display device of claim 12, wherein said metaltrace comprises a copper layer.
 14. The display device of claim 12,wherein said metal trace comprises an aluminum layer.
 15. The displaydevice of claim 1, wherein said metal conductor comprises a metal plug.16. The display device of claim 1 further comprising multiple LEDdevices formed on said glass substrate.
 17. The display device of claim1 further comprising multiple discrete passive components formed on saidglass substrate.
 18. The display device of claim 17, wherein saiddiscrete passive component comprises a discrete capacitor.
 19. Thedisplay device of claim 1 further comprising a first metal trace formedon a top surface of said glass substrate and a second metal trace formedon a bottom surface of said glass substrate, wherein said first metaltrace is connected to said second metal trace through one of said metalconductors.
 20. The display device of claim 1, wherein said displaypanel substrate comprises a touch screen function.